Filling high aspect-ratio nano-structures by atomic layer deposition and its applications in nano-optic devices and integrations

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 3209-3213

  Wang, Jian Jim ^a   Deng, Xuegong ^a   Varghese, Ron ^a   Nikolov, Anguel ^a   Sciortino, Paul ^a   Liu, Feng ^a   Chen, Lei ^a   Liu, Xiaoming ^a  

^a NanoOpto Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; NANO-GRATING STRUCTURES; POLARIZERS; TRENCH FILLINGS;

ASPECT RATIO; DEPOSITION; DIELECTRIC MATERIALS; INTEGRATED OPTICS; LAMINATES; OPTICAL DEVICES;

NANOSTRUCTURED MATERIALS;

EID: 29044444108     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2132326     Document Type: Article

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