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Volumn 8, Issue 12, 2005, Pages

Structurally and electrically uniform deposition of high-k TiO2thin films on a Ru electrode in three-dimensional contact holes using atomic layer deposition

(8) Kim, Seong Keun a Kim, Kyung Min a Kwon, Oh Seong a Lee, Sang Woon a Jeon, Chung Bae a Park, Woo Young a Hwang, Cheol Seong a Jeong, Jaehack b

a Seoul National University (South Korea)

b Ever tek Co (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; ELECTRODES; PERMITTIVITY; RUTHENIUM; THIN FILMS;

ATOMIC-LAYER-DEPOSITED (ALD); CONTACT HOLE;

TITANIUM DIOXIDE;

EID: 28044464256 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2081994 Document Type: Article

Times cited : (40)

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