The residual pattern of double thin-film over-etching for the fabrication of continuous patterns with dimensions varying from 50 nm to millimeters over a large area

Nanotechnology

Volumn 19, Issue 15, 2008, Pages

  Chen, Long Qing ^a   Chan Park, Mary B ^a   Yang, Chun ^b   Zhang, Qing ^c  

^a Nanyang Technological University   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; LINEWIDTH; MILLIMETER WAVE DEVICES; PHOTORESISTS; SUBSTRATES;

EDGE OVER-ETCHING; NANOPATTERNING; PATTERNED LINES; RESIDUAL PATTERN OF DOUBLE THIN-FILM OVER-ETCHING (RDTO);

THIN FILMS;

CHROMIUM; GOLD; NANOMATERIAL; SILICON;

ARTICLE; BIOMEDICAL ENGINEERING; FILM; MICROFLUIDICS; NANOARRAY; NANOFLUIDICS; PRIORITY JOURNAL;

EID: 42549105557     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/15/155301     Document Type: Article

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