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Volumn 18, Issue 35, 2007, Pages

High aspect ratio silicon nanomoulds for UV embossing fabricated by directional thermal oxidation using an oxidation mask

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MASKS; MOLDING; OXIDATION; PHOTOLITHOGRAPHY; POLYDIMETHYLSILOXANE; SILICON;

EID: 34548679169     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/35/355307     Document Type: Article
Times cited : (9)

References (14)
  • 14
    • 34250684641 scopus 로고    scopus 로고
    • Fabrication of thin-film organic transistor on flexible substrate via UV transfer embossing
    • Zhang J, Li C M, Chan-Park M B, Zhou Q, Gan Y, Qin F, Ong B and Chen T 2007 Fabrication of thin-film organic transistor on flexible substrate via UV transfer embossing Appl. Phys. Lett. 90 243502
    • (2007) Appl. Phys. Lett. , vol.90 , Issue.24 , pp. 243502
    • Zhang, J.1    Li, C.M.2    Chan-Park, M.B.3    Zhou, Q.4    Gan, Y.5    Qin, F.6    Ong, B.7    Chen, T.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.