Atomic layer deposition of TiO2 films on particles in a fluidized bed reactor

Powder Technology

Volumn 183, Issue 3, 2008, Pages 356-363

  King, David M ^a   Liang, Xinhua ^a   Zhou, Yun ^a   Carney, Casey S ^a   Hakim, Luis F ^a   Li, Peng ^b   Weimer, Alan W ^a  

^a UCB 450   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

Atomic layer deposition; Fluidized bed reactor; Mass spectrometry; Surface coatings; Titanium dioxide

Indexed keywords

ATOMIC LAYER DEPOSITION; FLUIDIZED BEDS; MASS SPECTROMETRY; NANOSTRUCTURED MATERIALS; TITANIUM DIOXIDE;

FLUIDIZED BED REACTOR; SURFACE COATINGS;

METALLIC FILMS;

HYDROGEN PEROXIDE; METAL; NANOFILM; NANOPARTICLE; ORGANIC COMPOUND; SILICONE DERIVATIVE; TITANIUM DIOXIDE; WATER; ZINC OXIDE;

ATOMIC LAYER DEPOSITION; FLUIDIZED BEDS; MASS SPECTROMETRY; METALLIC FILMS; NANOSTRUCTURED MATERIALS; TITANIUM DIOXIDE;

ARTICLE; ATOM; CHEMICAL REACTION; FILM; FILM COATING; FLUIDIZED BED REACTOR; GROWTH; MAGNETISM; MASS SPECTROMETER; OPTICS; PARTICLE SIZE; PARTICULATE MATTER; QUANTITATIVE ANALYSIS; SURFACE PROPERTY; TEMPERATURE; ULTRAVIOLET SPECTROSCOPY;

EID: 41549108889     PISSN: 00325910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.powtec.2008.01.025     Document Type: Article

References (27)

1. 2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry. Vacuum 80 (2005) 159
2. 2 pigmented paints: spectral dependence of the average pathlength parameter and the forward scattering ratio. Optics Communications 261 (2006) 71
3. 2 films grown by atomic layer deposition. Thin Solid Films 305 (1997) 270
4. Lavker R.M., and Kaidbey K.H. The spectral dependence for UVA-induced cumulative damage in human skin. Journal of Investigative Dermatology 108 (1997) 17
5. Lim H.W., Naylor M., Honigsmann H., Gilchrest B.A., Cooper K., Morison W., DeLeo V.A., and Scherschun L. American Academy of Dermatology Consensus Conference on UVA protection of sunscreens: summary and recommendations. Journal of the American Academy of Dermatology 44 (2001) 505
6. Lavker R.M., Gerberick G.F., Veres D., Irwin C.J., and Kaidbey K.H. Cumulative effects from repeated exposures to suberythemal doses of UVB and UVA in human skin. Journal of the American Academy of Dermatology 32 (1995) 53
7. Diffey B.L., Tanner P.R., Matts P.J., and Nash J.F. In vitro assessment of the broad-spectrum ultraviolet protection of sunscreen products. Journal of the American Academy of Dermatology 43 (2000) 1024
8. King D.M., Spencer J.A., Liang X.H., Hakim L.F., and Weimer A.W. Atomic layer deposition on particles using a fluidized bed reactor with in situ mass spectrometry. Surface & Coatings Technology 201 (2007) 9163-9171
9. George S.M., Ott A.W., and Klaus J.W. Surface chemistry for atomic layer growth. Journal of Physical Chemistry 100 (1996) 13121
10. 3 using ABAB - Binary Reaction Sequence Chemistry. Applied Surface Science 82 (1994) 460
11. Puurunen R. Growth per cycle in atomic layer deposition: a theoretical model. Chemical Vapor Deposition 9 (2003) 249
12. Lim B., Rahtu A., and Gordon R.G. Atomic layer deposition of transition metals. Nature Materials 2 (2003) 749
13. Leskela M., and Ritala M. Atomic layer deposition (ALD): from precursors to thin film structures. Thin Solid Films 409 (2002) 138
14. 2 on BN particles using sequential surface reactions. Applied Surface Science 162 (2000) 280
15. 3 particles. Journal of Vacuum Science & Technology A 23 (2005) 118
16. Aarik J., Aidla A., Uustare T., Ritala M., and Leskela M. Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process. Applied Surface Science 161 (2000) 385
17. Wu Y.M., Bradley D.C., and Nix R.M. Studies of titanium dioxide film growth from titanium tetraisopropoxide. Applied Surface Science 64 (1993) 21
18. Rahtu A., and Ritala M. Reaction mechanism studies on titanium isopropoxide-water atomic layer deposition process. Chemical Vapor Deposition 8 (2002) 21
19. Aarik J., Aidla A., Sammelselg V., Uustare T., Ritala M., and Leskela M. Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water. Thin Solid Films 370 (2000) 163
20. 2 thin films from titanium tetramethoxide and water. Chemical Vapor Deposition 10 (2004) 143
21. 2 on silica. Applied Surface Science, 60 (1992) 742
22. 2O. Applied Surface Science, 193 (2002) 277
23. Ritala M., Leskela M., Nykanen E., Soininen P., and Niinisto L. Growth of titanium dioxide thin films by atomic layer epitaxy. Thin Solid Films 225 (1993) 288
24. 4 and H2O. Applied Surface Science 226 (2004) 393
25. Stober W., Fink A., and Bohn E. Controlled growth of monodisperse silica spheres in micron size range. Journal of Colloid and Interface Science 26 (1968) 62
26. Hakim L.F., Blackson J.H., and Weimer A.W. Modification of interparticle forces for nanoparticles using atomic layer deposition. Chemical Engineering Science 62 (2007) 6199
27. Bohren C.F., and Huffman D.R. Absorption and Scattering of Light by Small Particles (1983), WILEY-VCH, Weinheim, Germany