Progress toward use of a dense plasma focus as a light source for production EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 232-248

  Partlo, W N ^a   Fomenkov, I V ^a   Ness, R M ^a   Oliver, R I ^a   Melnychuk, S T ^a   Rauch, J E ^a  

^a CYMER INC   (United States)

Author keywords

Dense Plasma Focus; EUV lithography; Solid state pulse power; Xenon emission

Indexed keywords

LIGHT SOURCES; MIRRORS; PLASMA APPLICATIONS; RAY TRACING; REFLECTION; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

LITHOGRAPHY;

EID: 0034762085     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436653     Document Type: Article

References (9)

1. Development of an EUV (13.5nm) light source employing a dense plasma focus in lithium vapor
2. Conversion efficiency and debris studies of ice targets for EUV projection lithography
3. Radio-frequency-preionized xenon Z-pinch source for extreme ultraviolet lithography
4. Flying circus EUV source comparison
5. Demonstration of a foil trap technique to eliminate laser plasma debris and small particles
6. Performance characterization of a high efficiency gas-fed pulsed plasma thruster
7. Trends in performance improvements of a gas-fed pulsed plasma thruster