Difference in high-temperature oxidation resistance of amorphous Zr-Si-N and W-Si-N films with a high Si content

Applied Surface Science

Volumn 252, Issue 23, 2006, Pages 8319-8325

  Zeman, P ^a   Musil, J ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Oxidation resistance; Sputtering; Thermogravimetry; W Si N; Zr Si N

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; OXIDATION RESISTANCE; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION ANALYSIS;

LIGHT OPTICAL MICROSCOPY (LOM); W-SI-N; ZR-SI-N;

AMORPHOUS FILMS;

EID: 33748291486     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.11.038     Document Type: Article

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