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Volumn 200, Issue 12-13, 2006, Pages 3886-3895

Properties of reactively sputtered W-Si-N films

(4) Musil, J a,b Daniel, R a Soldan J a Zeman, P a

a UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

d.c. reactive magnetron sputtering; High Si3N4 content; Mechanical properties; Oxidation resistance; Structure; Thermal stability; W Si N films

Indexed keywords

COMPOSITION EFFECTS; COMPRESSIVE STRESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROHARDNESS; NITRIDES; OXIDATION RESISTANCE; PHYSICAL PROPERTIES; PLASTIC DEFORMATION; SILICON; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY;

ELASTIC RECOVERY; TERNARY NITRIDES;

PROTECTIVE COATINGS;

COMPOSITION EFFECTS; COMPRESSIVE STRESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROHARDNESS; NITRIDES; OXIDATION RESISTANCE; PHYSICAL PROPERTIES; PLASTIC DEFORMATION; PROTECTIVE COATINGS; SILICON; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY;

EID: 32844462100 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.12.004 Document Type: Article

Times cited : (59)

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