Thermal stability of magnetron sputtered Zr-Si-N films

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 3368-3376

  Daniel, R ^a   Musil, J ^a   Zeman, P ^a   Mitterer, C ^b  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Crystallization; High Si3N4 content; Magnetron sputtering; Thermal stability; Zr Si N films

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CERAMIC MATERIALS; CRYSTALLIZATION; INTERDIFFUSION (SOLIDS); PHASE COMPOSITION; THERMODYNAMIC STABILITY;

AMBIENT ATMOSPHERE; MACROSTRESS;

MAGNETRON SPUTTERING;

AMORPHOUS FILMS; ANNEALING; CERAMIC MATERIALS; CRYSTALLIZATION; INTERDIFFUSION (SOLIDS); MAGNETRON SPUTTERING; PHASE COMPOSITION; THERMODYNAMIC STABILITY;

EID: 33750973045     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.206     Document Type: Article

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