Formation and physical properties of Al base alloys by sputtering

Vacuum

Volumn 59, Issue 1, 2000, Pages 252-259

  Naka, M ^a   Shibayanagi, T ^a   Maeda, M ^a   Zhao, S ^b   Mori, H ^b  

^a OSAKA UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ARGON; BINARY ALLOYS; MICROHARDNESS; SPUTTERING; THERMODYNAMIC STABILITY; TITANIUM ALLOYS;

ALUMINUM SILICON ALLOYS; ALUMINUM TITANIDE; TITANIUM ALUMINIDE; TITANIUM SILICON ALLOYS;

ALUMINUM ALLOYS;

EID: 0034299904     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00277-3     Document Type: Article

References (7)

1. Naka M., Shibayanagi T. J High Temp Soc. 24:1998;131.
2. Cohen M, Keath BH, Meharabian M. Proceedings of the Second International Conference on Rapid Solidification Processing, Claiter Publishing, Reston, Virginia, U.S.A., 1980:1.
3. Duwetz P. ASM. 60:1967;607.
4. Naka M., Inoue A., Masumoto T. Sci Rep Research Inst Tohoku Univ. A-26:1981;343.
5. Naka M, Shibayanagi T, Maeda M, Ogata Y. Proceedings of the First International Conference on Advances in Applied Plasma Science 1997, p. 123.
6. Alloy Phase Diagrams, ASM Int 1992;3:52.
7. Alloy Phase Diagrams, ASM Int 1992.