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Surface and Coatings Technology

Volumn 200, Issue 12-13, 2006, Pages 4091-4096

High-temperature oxidation resistance of Ta-Si-N films with a high Si content

(3) Zeman, P a Musil, J a Daniel, R a

a UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

Oxidation resistance; Sputtering; Ta Si N films; Thermogravimetry

Indexed keywords

ANNEALING; MAGNETRON SPUTTERING; MICROHARDNESS; OPTICAL MICROSCOPY; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURE; MICROHARDNESS MEASUREMENT; OXIDE LAYER; SYMMETRICAL HIGH-RESOLUTION THERMOGRAVIMETRY; TANTALUM-SILICON-NITROGEN FILMS;

PROTECTIVE COATINGS;

ANNEALING; MAGNETRON SPUTTERING; MICROHARDNESS; OPTICAL MICROSCOPY; OXIDATION RESISTANCE; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION ANALYSIS;

EID: 32644461597 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.097 Document Type: Article

Times cited : (49)

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