Ti-Si-N films with a high content of Si

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Musil, Jindrich ^a   Zeman, Petr ^a   Dohnal, Pavel ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

DC discharges; Films; Oxidation; Si content; Structure; Ti Si N film

Indexed keywords

DC DISCHARGES; DUAL MAGNETRON SPUTTERING SYSTEM; HIGH HARDNESS; HIGH-CONTENT; OXIDATION TEMPERATURE; PULSE MODES; SI CONTENT; SI(1 0 0); STRUCTURE; TI-SI-N; TI-SI-N FILM; X-RAY AMORPHOUS; YOUNG'S MODULUS;

AMORPHOUS SILICON; CORUNDUM; MAGNETIC FIELDS; MECHANICAL PROPERTIES; METALLIC FILMS; OXIDATION; SILICON; SUBSTRATES; TITANIUM COMPOUNDS;

AMORPHOUS FILMS;

EID: 40949159528     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731408     Document Type: Conference Paper

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