Si cleaning method without surface morphology change by cyanide solutions

Applied Surface Science

Volumn 254, Issue 12, 2008, Pages 3715-3720

  Takahashi, Masao ^a   Liu, Yueh Ling ^a   Narita, Hiroaki ^a   Kobayashi, Hikaru ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Copper; Cyanide solutions; Etching; Morphology; Silicon; Surface cleaning

Indexed keywords

ATOMIC FORCE MICROSCOPY; HYDROCHLORIC ACID; HYDROGEN PEROXIDE; SILICON; SURFACE CLEANING; SURFACE MORPHOLOGY;

CYANIDE SOLUTIONS; HYDROGEN CYANIDE;

CYANIDES;

EID: 40849088270     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.10.090     Document Type: Article

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