Mechanism of Ni removal from Si materials using hydrogen cyanide aqueous solutions

Journal of the Electrochemical Society

Volumn 154, Issue 1, 2007, Pages

  Liu, Yueh Ling ^a   Takahashi, Masao ^a,b   Kobayashi, Hikaru ^a  

^a OSAKA UNIVERSITY   (Japan)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); CYANIDES; IMPURITIES; SILICON; SOLUTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN CYANIDES; READSORPTION; TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROSCOPY;

NICKEL;

EID: 33845273275     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2372692     Document Type: Article

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