Optical and electrical characterization of SiO2 films obtained by atmospheric pressure chemical vapor deposition

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 4, Issue 4, 2007, Pages 1481-1484

  Juarez H ^a   Diaz T ^a   Pacio, M ^b   Garcia S G ^a   Rosendo, E ^a   Rubin, M ^a   Romero, G ^b   Garcia A ^b   Morales, C ^b  

^a BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOUND SEMICONDUCTOR; EXPERT EVALUATION; OPTICAL AND ELECTRICAL CHARACTERIZATION;

ARSENIC COMPOUNDS; CHLORINE COMPOUNDS; ELECTRIC CONDUCTIVITY; SILICON COMPOUNDS; TECHNOLOGY;

SEMICONDUCTOR MATERIALS;

EID: 40749142457     PISSN: 18626351     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssc.200674157     Document Type: Conference Paper

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