Modeling of Silicon Dioxide Chemical Vapor Deposition from Tetraethoxysilane and Ozone

Journal of the Electrochemical Society

Volumn 148, Issue 2, 2001, Pages

  Romet, S ^a   Couturier, M F ^a   Whidden, T K ^a,b  

^a UNIVERSITY OF NEW BRUNSWICK   (Canada)

^b Xylaur Enterprises   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346789723     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1342186     Document Type: Article

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