SiO2 aerogel film as a novel intermetal dielectric

Journal of Applied Physics

Volumn 82, Issue 3, 1997, Pages 1299-1304

  Jo, Moon Ho ^a   Park, Hyung Ho ^a   Kim, Dong Joon ^a   Hyun, Sang Hoon ^a   Choi, Se Young ^a   Paik, Jong Tae ^a,b  

^a Yonsei University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343494496     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365902     Document Type: Article

References (22)

1. S. P. Jeng, R. H. Havemann, and M. C. Chang, Mater. Res. Soc. Symp. Proc. 25, 337 (1994).
2. C. B. Case, A. Kornblit, K. S. Y. Lau, and N. H. Hendricks, Proc. ISMIC Conf. 104, 116 (1995).
3. S. P. Murarka, Solid State Technol. 39, 83 (1996).
4. L. W. Hrubesh and J. F. Poco, J. Non-Cryst. Solids 188, 46 (1995).
5. L. W. Hrubesh, L. E. Keene, and V. R. Latorre, J. Mater. Res. 8, 1736 (1993).
6. M. H. Jo, J. K. Hong, H. H. Park, J. J. Kim, and S. H. Hyun, Microelectron. Eng. 33, 343 (1997).
7. D. J. Kim and S. H. Hyun, J. Korean Ceram. Soc. 33, 485 (1996).
8. W. K. Chu, J. W. Mayer, and M.-A. Nicolet, Backscattering Spectrometry (Academic, Orlando, 1978), p. 86.
9. L. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 9, 334 (1985); 15, 227 (1986).
10. L. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 9, 334 (1985); 15, 227 (1986).
11. B. K. Hwang, J. H. Choi, H. J. Shin, U. I. Chung, S. I. Lee, and M. Y. LEE, Proc. ISMIC Conf. 104, 113 (1995).
12. T. Homma and Y. Murao, Proc. ISMIC Conf. 101, 65 (1992).
13. P. L. Pai, A. C. Chetty, R. Root, N. Cox, and C. Ting, J. Electrochem. Soc. 134, 2829 (1987).
14. T. Woignier and J. Phalippou, J. Mater. Sci. 25, 3118 (1990).
15. J. Chastain, Handbook of X-ray Photoelectron Spectroscopy (PerkinElmer, Eden Prairie, MN, 1992), p. 231.
16. P. Kelfve, B. Blomster, H. Siegbahn, and K. Siegbahn, Phys. Scr. 21, 75 (1980).
17. P. D. Dietz, P. K. Hansma, O. Inacker, H. D. Lehmann, and K. Heinz, J. Membrane Sci. 65, 101 (1992).
18. W. R. Bowen, N. Hilal, R. W. Tovitt, and P. M. Wiliam, J. Membrane Sci. 110, 233 (1996).
19. C. S. Hwang, S. O. Park, H. J. Cho, C. S. Kang, H. K. Kang, S. I. Lee, and M. Y. Lee, Appl. Phys. Lett. 67, 2819 (1995).
20. H. Y. Lee, K. C. Lee, J. N. Scunke, and L. C. Burton, IEEE Trans. Compon. Hybrids, Manuf. Technol. CHMT-7, 443 (1984).
21. M. Matsuura, Y. Hayashide, H. Kotani, and H. Abe, Jpn. J. Appl. Phys. 1 30, 1530 (1991).
22. T. Homma and Y. Murao, J. Electrochem. Soc. 140, 2046 (1993).