Effect of fluorine on chemical and electrical properties of room temperature oxide films prepared by plasma enhanced chemical vapor deposition

Applied Physics Letters

Volumn 72, Issue 10, 1998, Pages 1247-1249

  Kim, Kihong ^a   Song, Juho ^a   Kwon, Daehyuk ^a   Lee, G S ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347329918     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121027     Document Type: Article

References (13)

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