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Volumn 2, Issue 1, 2008, Pages 30-36

Case study and efficient modelling for variational chemical-mechanical planarisation

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC PROPERTIES; INTEGRATED CIRCUITS; MICROPROCESSOR CHIPS; TUNGSTEN;

EID: 40349088972     PISSN: 1751858X     EISSN: None     Source Type: Journal    
DOI: 10.1049/iet-cds:20070187     Document Type: Article
Times cited : (3)

References (24)
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    • Perry, K.A.1
  • 2
    • 40349092021 scopus 로고    scopus 로고
    • (Cornell University accessed 2001
    • Woodie, D.: ' Chemical mechanical polishing (cmp) ', (Cornell University, Available at: http://www.cnf.cornell.edu/doc/CMP%20Primer.pdf, accessed 2001
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    • CMP modeling and characterization for polysilicon MEMS structures
    • Tang, B., and Boning, D.: ' CMP modeling and characterization for polysilicon MEMS structures ', Material Research Society Symp., K7.5, 2004
    • (2004) Material Research Society Symp., K7.5
    • Tang, B.1    Boning, D.2
  • 8
    • 0001240604 scopus 로고    scopus 로고
    • A mathematical model of pattern dependencies in cu cmp processes
    • et al. ' '
    • Tugbawa, T., Park, T., and Boning, D.: et al. ' A mathematical model of pattern dependencies in cu cmp processes ', CMP Symp., Electrochemical Society Meeting, 1999, p. 605-615
    • (1999) CMP Symp., Electrochemical Society Meeting , pp. 605-615
    • Tugbawa, T.1    Park, T.2    Boning, D.3
  • 10
    • 40349099125 scopus 로고    scopus 로고
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  • 11
    • 40349095327 scopus 로고    scopus 로고
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  • 14
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    • et al. ' '
    • He, L., Kahng, A.B., and Tam, K.: et al. ' Variability-driven considerations in the design of integrated-circuit global interconnects ', IEEE VLSI Multilevel Interconnection Conf., 2004, p. 214-221
    • (2004) IEEE VLSI Multilevel Interconnection Conf. , pp. 214-221
    • He, L.1    Kahng, A.B.2    Tam, K.3
  • 18
    • 40349102546 scopus 로고    scopus 로고
    • Simultaneous buffer insertion and wire sizing considering systematic cmp variation and random leff variation
    • He, L., Kahng, A.B., and Tam, K.: et al. ' Simultaneous buffer insertion and wire sizing considering systematic cmp variation and random leff variation ', Proc. Int. Symp. Physical Design (ISPD), 2004
    • (2004) Proc. Int. Symp. Physical Design (ISPD)
    • He, L.1    Kahng, A.B.2    Tam, K.3
  • 19
    • 34748838914 scopus 로고    scopus 로고
    • Dummy fill aware buffer insertion during routing
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  • 22
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    • Impact of multi-level chemical mechanical polishing on 90nm and below'. (invited paper)
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    • White, D., and Gower, A.: ' Impact of multi-level chemical mechanical polishing on 90nm and below'. (invited paper) ', 22nd, Int. VLSI/ULSI Multilevel Interconnect Conf., October, 2005
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    • White, D.1    Gower, A.2
  • 23
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.