Chemical mechanical polishing: The impact of a new technology on an industry

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1998, Pages 2-5

  Perry, Kathleen A ^a  

^a Obsidian   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; COLLOID CHEMISTRY; REACTION KINETICS; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE CHEMISTRY; SYNTHESIS (CHEMICAL); THERMODYNAMICS;

CHEMICAL MECHANICAL POLISHING (CMP);

ELECTRONICS INDUSTRY;

EID: 0031618510     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)