Properties of TiO2 thin films deposited by RF magnetron sputtering

Journal of Optoelectronics and Advanced Materials

Volumn 9, Issue 5, 2007, Pages 1446-1449

  Sima, C ^a   Waldhauser, W ^b   Lackner, J ^b   Kahn, M ^b   Nicolae, I ^a   Viespe, C ^a   Grigoriu, C ^a   Manea, A ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b JOANNEUM RESEARCH   (Austria)

^c NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

Nanocrystalline films; Optical transmission; RF magnetron sputtering; Tio2 thin films

Indexed keywords

DEPOSITION RATES; ITO GLASS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; MORPHOLOGY; NANOCRYSTALS; OXIDE MINERALS; THIN FILMS; TITANIUM DIOXIDE; TRANSMISSIONS;

EXPERIMENTAL CONDITIONS; EXPERIMENTAL DEPOSITION; FILM PROPERTIES; FILM STRUCTURE; NANO-CRYSTALLINE FILMS; RF-MAGNETRON SPUTTERING; TIO2 THIN FILMS; TITANIA FILMS;

OPTICAL FILMS;

EID: 38549116213     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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