Physical properties of high pressure reactively sputtered TiO2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 6, 2005, Pages 1523-1530

  San Andres E ^a   Toledano Luque, M ^a   Del Prado, A ^a   Navacerrada, M A ^a   Martil I ^a   Gonzalez Diaz G ^a   Bohne, W ^b   Rohrich J ^b   Strub, E ^b  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON DIFFRACTION; HEAVY IONS; INFRARED SPECTROSCOPY; MORPHOLOGY; PHASE TRANSITIONS; SPUTTERING; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIFFRACTION MEASUREMENTS; ELASTIC RECOIL DETECTION ANALYSIS; RUTILE PHASE;

TITANIUM COMPOUNDS;

EID: 31144453438     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2056554     Document Type: Article

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