Synthesis and properties of TiO2 thin films by plasma source ion implantation

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 241-243

  Baba, Koumei ^a   Hatada, Ruriko ^a  

^a INDUSTRIAL TECHNOLOGY CENTER OF NAGASAKI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; ION IMPLANTATION; PLASMA SOURCES; QUARTZ; RAMAN SPECTROSCOPY; SILICON WAFERS; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOCATALYSIS; PLASMA SOURCES ION IMPLANTATION;

METALLIC FILMS;

EID: 0035254355     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01022-7     Document Type: Article

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