Secondary electron emission control in X-ray photoelectron spectroscopy

Journal of Electron Spectroscopy and Related Phenomena

Volumn 162, Issue 2, 2008, Pages 99-105

  Vilan, Ayelet ^a   Bendikov, Tatyana A ^a   Cohen, Hagai ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

Chemically resolved electrical measurements; Differential surface charging; Secondary electron emission; XPS

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; SILICA; SUBSTRATES; SURFACE CHARGE; SURFACE POTENTIAL; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICALLY RESOLVED ELECTRICAL MEASUREMENTS; DIFFERENTIAL SURFACE CHARGING;

SECONDARY EMISSION;

EID: 37149015781     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2007.10.001     Document Type: Article

References (40)

1. Seah M.P. second ed. In: Briggs D., and Seah M.P. (Eds). Practical Surface Analysis vol. 1 (1999), Wiley, Chichester, NY 541
2. Dickinson T., Povey A.F., and Sherwood P.M.A. J. Electron Spectrosc. Relat. Phenom. 2 (1973) 441
3. Cros A. J. Electron Spectrosc. Relat. Phenom. 59 (1992) 1
4. Cazaux J. J. Electron Spectrosc. Relat. Phenom. 105 (1999) 155
5. Morrey J.R. Anal. Chem. 41 (1968) 905
6. Pireaux J.J. Appl. Spectrosc. 30 (1976) 219
7. Kelly M.A., and Tyler C.E. HP J. 24 (1973) 2
8. Lau W.M. Appl. Phys. Lett. 54 (1989) 338
9. Lau W.M. J. Appl. Phys. 67 (1990) 1504
10. Lau W.M., and Wu X.W. Surf. Sci. 245 (1991) 345
11. Shabtai K., Rubinstein I., Cohen S.R., and Cohen H. J. Am. Chem. Soc. 122 (2000) 4959
12. Doron Mor I., Hatzor A., Vaskevich A., Boom-Moav T.v.-d., Shanzer A., Rubinstein I., and Cohen H. Nature 406 (2000) 382
13. Feldman Y., Zak A., Tenne R., and Cohen H. J. Vac. Sci. Technol. A 21 (2003) 1752
14. Lewis R., and Kelly M. J. Electron Spectrosc. Relat. Phenom. 20 (1980) 105
15. Dubey M., Gouzman I., Bernasek S., and Schwartz J. Langmuir 22 (2006) 4649
16. Ulgut B., and Suzer S. J. Phys. Chem. B 107 (2003) 2939
17. Etras G., and Suzer S. Surf. Interface Anal. 36 (2004) 619
18. Demirok U.K., Etras G., and Suzer S. J. Phys. Chem. B 108 (2004) 5179
19. Cohen H. Appl. Phys. Lett. 85 (2004) 1271
20. Cohen H., Nogues C., Zon I., and Lubomirsky I. J. Appl. Phys. 97 (2005) 11370
21. Cohen H., Maoz R., and Sagiv J. Nano Lett. 6 (2006) 2462
22. Cohen H., Sarkar S.K., and Hodes G. J. Phys. Chem. B 110 (2006) 25508
23. Filip-Granit N., van der Boom M.E., Yerushalmi R., Scherz A., and Cohen H. Nano Lett. 6 (2006) 2848
24. Cohen H., Zenkina O.V., Shukla A.D., and van der Boom M.E. J. Phys. Chem. B 110 (2006) 1506
25. Larson P.E., and Kelly M.A. J. Vac. Sci. Technol. A 16 (1998) 3483
26. Chan R.W.M., Kwok R.W.M., and Lau W.M. J. Appl. Phys. 79 (1996) 3635
27. Havercroft J., and Sherwood P.M.A. Surf. Interface Anal. 29 (2000) 232
28. Ertas G., Demirok U.K., and Suzer S. Appl. Surf. Sci. 249 (2005) 12
29. Ertas G., Demirok U.K., Talat A., and Suzer S. Appl. Phys. Lett. 86 (2005) 183110
30. Contour J.P., and Mouvier G. Chem. Phys. Lett. 33 (1975) 237
31. Davidson S.M. In: Holt D.B., and Joy D.C. (Eds). SEM Microcharacterization of Semiconductors (1989), Academic Press, London 153
32. Bryson C.E. Surf. Sci. 189 (1987) 50
33. Wanunu M., Vaskevich A., and Rubinstein I. J. Am. Chem. Soc. 126 (2004) 5569
34. Ruach-Nir I., Bendikov T.A., Doron-Mor I., Barkay Z., Vaskevich A., and Rubinstein I. J. Am. Chem. Soc. 129 (2007) 84
35. 2 layers was calculated from XPS measurements.
36. Liz-Marzan L.M., Giersig M., and Mulvaney P. Langmuir 12 (1996) 4329
37. Ron H., Matlis S., and Rubinstein I. Langmuir 14 (1998) 1116
38. The APTS-coated sample had a non-typical silica thickness of ca. 10 nm (calculated from XPS measurements), assumed to arise from inhomogeneity of the silica coating of the particular sample.
39. The high angular sensitivity of sub-eV electron optics (not discussed here) has been found to be a critical aspect of the detailed SEE peak shape under small iris conditions. As a result, when the SEE peak is already suppressed, tighter similarity with the current-derived curves is obtained.
40. The nitrogen signal in this experiment exhibited irreversible chemical reduction. Therefore, electrically reliable data could be taken only after this reduction process was completed. Repetitive scans were performed to follow these modifications.