Improvement of the 2D dynamic CA method for photoresist etching simulation and its application to deep UV lithography simulations of SU-8 photoresists

Journal of Micromechanics and Microengineering

Volumn 17, Issue 12, 2007, Pages 2538-2547

  Zhou, Zai Fa ^a   Huang, Qing An ^a   Li, Wei Hua ^a   Feng, Ming ^a   Lu, Wei ^a   Zhu, Zhen ^a  

^a Southeast University   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATION THEORY; COMPUTER SIMULATION; LITHOGRAPHY; PHOTORESISTORS;

IMAGE SIMULATION; UV LITHOGRAPHY;

CELLULAR AUTOMATA;

EID: 36949021784     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/12/021     Document Type: Article

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