A novel 3-D dynamic cellular automata model for photoresist-etching process simulation

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 26, Issue 1, 2007, Pages 100-113

  Zhou, Zai Fa ^b   Huang, Qing An ^a,b   Li, Wei Hua ^b   Lu, Wei ^b  

^a IEEE   (China)

^b Southeast University   (China)

Author keywords

Cellular automata (CA); Modeling; Photolithog raphy simulation; Process simulation; Technology computer aided design (TCAD)

Indexed keywords

CELLULAR AUTOMATA (CA); PHOTOLITHOG-RAPHY SIMULATION; PROCESS SIMULATION; TECHNOLOGY COMPUTER-AIDED DESIGN (TCAD);

AUTOMATA THEORY; COMPUTER SIMULATION; ETCHING; PHOTORESISTS; SEMICONDUCTOR DEVICE MODELS;

COMPUTER AIDED DESIGN;

EID: 33846218160     PISSN: 02780070     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCAD.2006.882510     Document Type: Article

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