Notch model for photoresist dissolution

Electrochemical and Solid-State Letters

Volumn 1, Issue 2, 1998, Pages 86-87

  Mack, Chris A ^a   Arthur, Graham ^b  

^a KLA Tencor Austin   (United States)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; DISSOLUTION; MATHEMATICAL MODELS; REACTION KINETICS;

PHOTOACTIVE COMPOUNDS;

PHOTORESISTS;

EID: 0032142299     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390645     Document Type: Article

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