An efficient photoresist development simulator based on cellular automata with experimental verification

IEEE Transactions on Semiconductor Manufacturing

Volumn 13, Issue 1, 2000, Pages 61-75

  Karafyllidis, Ioannis ^a,b   Hagouel, Paul Issac ^a,c   Thanailakis, Antonios ^b   Neureuther, Andrew R ^a,c  

^a IEEE   (Greece)

^b DEMOCRITUS UNIVERSITY OF THRACE   (Greece)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Cellular automata; Development; Modeling; Photolithography; Simulation

Indexed keywords

AUTOMATA THEORY; COMPUTER SIMULATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS;

CELLULAR AUTOMATA;

PHOTORESISTS;

EID: 0033890541     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.827346     Document Type: Article

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