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Volumn , Issue , 2006, Pages 568-574

An electrothermally-aware full-chip substrate temperature gradient evaluation methodology for leakage dominant technologies with implications for power estimation and hot-spot management

Author keywords

[No Author keywords available]

Indexed keywords

(OTDR) TECHNOLOGY; ACCURATE ESTIMATION; CHIP-LEVEL; CMOS TECHNOLOGIES; COMPUTER-AIDED DESIGN; CUBIC STRUCTURES; ELECTRO THERMAL COUPLING; EVALUATION METHODOLOGIES; HOT SPOTTING; HOT-SPOTS; INHOMOGENEOUS LAYERS; INTERNATIONAL CONFERENCES; NANO-METER REGIMES; ON CHIPS; POWER DISSIPATIONS; POWER ESTIMATIONS; SILICON (111) SUBSTRATES; SUB THRESHOLD LEAKAGE; SUBSTRATE TEMPERATURE (ST); TRADITIONAL METHODS; VLSI DESIGNS;

EID: 36849066113     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICCAD.2006.320176     Document Type: Conference Paper
Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.