Highly moisture-resistive SiNx films by catalytic chemical vapor deposition and their application to passivation and antireflection coating for crystalline Si solar cells

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1147-1150

  Matsumura, Hideki ^a   Kikkawa, Akiko ^a   Tsutsumi, Takayuki ^a   Masuda, Atsushi ^a   Izumi, Akira ^a   Takahashi, Masatoshi ^b   Ohtsuka, Hiroyuki ^b   Moschner, Jens D ^c  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b SHIN ETSU CHEMICAL CO LTD   (Japan)

^c INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRACKING REACTIONS; MOISTURE RESISTIVITY; NITRIDATION; PLASMA DAMAGE;

ANTIREFLECTION COATINGS; APPROXIMATION THEORY; LEAKAGE CURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING FILMS; SILICON WAFERS;

SOLAR CELLS;

EID: 6344249000     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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