Hot wire-CVD deposited a-SiOx and its characterization

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 95-97

  Matsumoto, Yasuhiro ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Amorphous silicon oxide; Cat CVD; Wide bandgap

Indexed keywords

AMORPHOUS SILICON; CATALYSIS; OPTICAL SYSTEMS; REACTION KINETICS; SILANES; TUNGSTEN;

AMORPHOUS SILICON OXIDE; CAT-CVD; OPTICAL BANDGAP; WIDE-BANDGAP;

CHEMICAL VAPOR DEPOSITION;

EID: 32644444460     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.132     Document Type: Conference Paper

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