Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 240-243

  Itoh, Takashi ^a   Katoh, Yoshiaki ^a   Fujiwara, Takao ^a   Fukunaga, Kazunori ^a   Nonomura, Shuichi ^a   Nitta, Shoji ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

B doping; Hot wire CVD; Microcrystalline silicon; Silicon carbon alloy

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CARBON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); HYDROGENATION; INFRARED RADIATION; PHOTOCONDUCTIVITY; SILICON ALLOYS; THIN FILMS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); MICROCRYSTALLINE SILICON;

FILM PREPARATION;

EID: 0035800983     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01260-3     Document Type: Conference Paper

References (9)