Preparation of SiO2 thin films using the Cat-CVD method

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 287-291

  Saito, K ^a   Uchiyama, Y ^a   Abe, K ^a  

^a ULVAC INC   (Japan)

Author keywords

Catalytic chemical vapor deposition (Cat CVD); Iridium catalyst; Silicon oxide

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC BREAKDOWN; FILM PREPARATION; IRIDIUM; SILICA;

IRIDIUM CATALYSTS;

THIN FILMS;

EID: 0037809490     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00083-X     Document Type: Conference Paper

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