Etching properties of Al2O3 films in inductively coupled plasma

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 122-126

  Kim, Dong Pyo ^a   Yeo, Ji Won ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Al2O3; Inductively coupled plasma; Optical emission spectroscopy (OES); X Ray photoelectron spectroscopy (XPS)

Indexed keywords

ADDITIVES; ALUMINA; ELECTROLUMINESCENCE; ETCHING; THIN FILMS; VOLATILE ORGANIC COMPOUNDS; VOLTAGE CONTROL; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

CHEMICAL ETCHING; CHEMICAL STATES; OPTICAL EMISSION SPECTROSCOPY (OES); VOLUME DENSITY;

INDUCTIVELY COUPLED PLASMA;

EID: 2942534413     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.113     Document Type: Conference Paper

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