Multi-crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot-wire CVD silicon nitride as antireflection coating

Progress in Photovoltaics: Research and Applications

Volumn 15, Issue 7, 2007, Pages 563-573

  Verlaan, V ^a   Van Der Werf, C H M ^a   Houweling, Z S ^a   Romijn, I G ^b   Weeber, A W ^b   Dekkers, H F W ^c   Goldbach, H D ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b TNO   (Netherlands)

^c IMEC   (Belgium)

Author keywords

Antireflection coating; Hot wire CVD; Multicrystalline solar cells; Silicon nitride

Indexed keywords

ANTIREFLECTION COATINGS; CHEMICAL VAPOR DEPOSITION; LIGHT ABSORPTION; PASSIVATION; SILICON; SILICON NITRIDE;

DEPOSITION RATE; MULTICRYSTALLINE SOLAR CELLS;

SOLAR CELLS;

EID: 35449008096     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.760     Document Type: Article

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