Various applications of silicon nitride by catalytic chemical vapor deposition for coating, passivation and insulating films

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 149-153

  Masuda, Atsushi ^a,b   Umemoto, Hironobu ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chemical vapor deposition (CVD); Insulators; Passivation; Silicon nitride

Indexed keywords

CATALYSIS; CHEMICAL VAPOR DEPOSITION; COATINGS; ELECTRIC INSULATORS; PASSIVATION; THIN FILMS;

CATALYTIC CHEMICAL VAPOR DEPOSITION (CAT-CVD); DENSE FILMS; TRANSMISSION RATE; WATER-VAPOR TRANSMISSION;

SILICON NITRIDE;

EID: 32644436297     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.172     Document Type: Conference Paper

References (28)

1. H. Matsumura J. Appl. Phys. 66 1989 3612
2. K. Yasui, H. Katoh, K. Komaki, and S. Kaneda Appl. Phys. Lett. 56 1990 898
3. J.L. Dupuie, E. Gulari, and F. Terry J. Electrochem. Soc. 139 1992 1151
4. S. Okada, and H. Matsumura Jpn. J. Appl. Phys. 36 1997 7035
5. S. Osono, Y. Uchiyama, M. Kitazoe, K. Saito, M. Hayama, A. Masuda, A. Izumi, and H. Matsumura Thin Solid Films 430 2003 165
6. M. Sakai, T. Tsutsumi, T. Yoshioka, A. Masuda, and H. Matsumura Thin Solid Films 395 2001 330
7. B. Stannowski, J.K. Rath, and R.E.I. Schropp Thin Solid Films 395 2001 339
8. Q. Wang, S. Ward, L. Gedvilas, B. Keyes, E. Sanchez, and S. Wang Appl. Phys. Lett. 84 2004 338
9. M. Kitazoe, S. Osono, H. Itoh, S. Asari, K. Saito, and M. Hayama Thin Solid Films 501 2005 160 (this issue)
10. A. Masuda, M. Totsuka, T. Oku, R. Hattori, and H. Matsumura Vacuum 74 2004 525
11. H. Umemoto, K. Ohara, D. Morita, Y. Nozaki, A. Masuda, and H. Matsumura J. Appl. Phys. 91 2002 1650
12. R. Hattori, G. Nakamura, S. Nomura, T. Ichise, A. Masuda, and H. Matsumura Tech. Dig. 19th IEEE Gallium Arsenide Integrated Circuits Symp., Anaheim 1997 78
13. Y. Miyoshi, S. Okada, H. Matsumura, S. Nomura, M. Kohno, Y. Nashimoto, and M. Mizuta Ext. Abst. 44th Spring Meeting Jpn. Soc. Appl. Phys. and Related Societies, Funabashi 1997 1280 (in Japanese)
14. K. Saitoh, A. Izumi, A. Masuda, and H. Matsumura Ext. Abst. 1st Meeting Cat-CVD, Kanazawa 2004 47 (in Japanese)
15. A. Izumi, A. Masuda, and H. Matsumura Thin Solid Films 343-344 1999 528
16. J.D. Moschner, J. Schmidt, and R. Hezel Conf. Record 29th IEEE Photovoltaic Specialists Conf.-2002, New Orleans 2002 174
17. H. Matsumura, A. Kikkawa, T. Tsutsumi, A. Masuda, A. Izumi, M. Takahashi, H. Ohtsuka, and J.D. Moschner Proc. 3rd World Conf. Photovoltaic Energy Conversion, Osaka 2003 1147
18. A. Heya, T. Niki, M. Takano, Y. Yonezawa, T. Minamikawa, S. Muroi, S. Minami, H. Maruyama, H. Ito, A. Masuda, H. Umemoto, H. Matsumura, Dig. Tech. Papers 2004 Int. Workshop Active-Matrix Liquid-Crystal Displays-TFT Technologies and Related Materials, Tokyo, 2004, p. 131.
19. Exhibition Directory 14th FPD Manufacturing Technology Expo and Conf., Tokyo 2004 187
20. M. Takano, T. Niki, A. Heya, Y. Yonezawa, T. Minamikawa, S. Muroi, S. Minami, A. Masuda, H. Umemoto, H. Matsumura, Dig. Tech. Papers 2004 Int. Workshop Active-Matrix Liquid-Crystal Displays-TFT Technologies and Related Materials, Tokyo, 2004, p. 135.
21. N. Kawamoto, A. Masuda, I. Hasegawa, N. Matsuo, F. Anwar, Y. Yogoro, K. Yamano, H. Matsumura, H. Hamada, K. Shibata, Dig. Tech. Papers 2003 Int. Workshop Active-Matrix Liquid-Crystal Displays-TFT Technologies and Related Materials, Tokyo, 2003, p. 129.
22. D. Kaminishi, H. Ozaki, Y. Ohno, K. Maehashi, K. Inoue, K. Matsumoto, Y. Seri, A. Masuda, and H. Mastumura Appl. Phys. Lett. 86 2005 113115
23. A. Kikkawa, A. Izumi, H. Matsumura, Dig. Tech. Papers 2003 Int. Workshop Active-Matrix Liquid-Crystal Displays-TFT Technologies and Related Materials, Tokyo, 2003, p. 95.
24. H. Sato, A. Izumi, and H. Matsumura Appl. Phys. Lett. 77 2000 2752
25. T. Tsutsumi, R. Morimoto, A. Izumi, and H. Matsumura Ext. Abst. 61st Autumn Meeting Jpn. Soc. Appl. Phys., Sapporo 2000 820 (in Japanese)
26. H. Umemoto, T. Morimoto, M. Yamawaki, Y. Masuda, A. Masuda, and H. Matsumura Thin Solid Films 430 2003 24
27. D.L. Smith, A.S. Alimonda, C.-C. Chen, S.E. Ready, and B. Wacker J. Electrochem. Soc. 137 1990 614
28. D.B. Beach, and J.M. Jasinski J. Phys. Chem. 94 1990 3019