Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 76, Issue 3, 1997, Pages 309-321

  Schropp, R E I ^a   Feenstra, K F ^a   Molenbroek, E C ^a   Meiling, H ^a   Rath, J K ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844321308     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418639708241096     Document Type: Article

References (32)

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