Molecular hydrogen formation in hydrogenated silicon nitride

Applied Physics Letters

Volumn 89, Issue 21, 2006, Pages

  Dekkers, H F W ^a   Beaucarne, G ^a   Hiller, M ^b   Charifi, H ^c   Slaoui, A ^c  

^a IMEC   (Belgium)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c Faculté de Médecine   (France)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT; HYDROGEN; HYDROGENATION; RAMAN SPECTROSCOPY; SILICON; SUBSTRATES;

MASS DENSITY; MOLECULAR HYDROGEN;

SILICON NITRIDE;

EID: 33845415971     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2396900     Document Type: Article

References (22)

1. Choong-Heui Chung, Yong-Hae Kim, Jaehyun Moon, Myung-Hee Lee, Jung Wook Lim, Sun Jin Yun, Dong-Jin Park, Dae-Won Kim, and Jin Ho Lee, Appl. Phys. Lett. 88, 073516 (2006).
2. L. Cai, A. Rohatgi, D. Yang, and M. A. El-Sayed, J. Appl. Phys. 80, 5384 (1996).
3. J. Hong, W. M. M. Kessels, W. J. Soppe, A. W. Weeber, W. M. Arnoldbik, and M. W. M. van de Sanden, J. Vac. Sci. Technol. B 21, 2123 (2003).
4. H. F. W. Dekkers, L. Carnel, and G. Beaucarne, Appl. Phys. Lett. 89, 013508 (2006).
5. A. W. Weeber, H. C. Rieffe, H. C. I. G. Romijn, W. C. Sinke, and W. J. Soppe, Conference Record of the 31st IEEE Photovoltaic Specialists Conference (IEEE, New York, 2005), p. 1043.
6. C. Boehme and G. Lucovsky, J. Vac. Sci. Technol. A 19, 2622 (2001).
7. Michael P. Hughey and Robert F. Cook, J. Appl. Phys. 97, 114914 (2005).
8. F. L. Martínez, A. del Prado, I. Mártil, G. González-Diaz, W. Bohne, W. Fuhs, J. Röhrich, B. Selle, and I. Sieber, Phys. Rev. B 63, 245320 (2001).
9. W. Beyer and H. F. W. Dekkers, Mater. Res. Soc. Symp. Proc. 910, 0910-A06-05 (2006).
10. B. P. Stoicheff, Can. J. Phys. 35, 730 (1957).
11. K. Ishioka, M. Kitajima, S. Tateishi, K. Nakanoya, N. Fukata, T. Mori, K. Murakamit, and S. Hishita, Phys. Rev. B 60, 10852 (1999).
12. A. W. R. Leitch, V. Alex, and J. Weber, Phys. Rev. Lett. 81, 421 (1998).
13. R. E. Pritchard, M. J. Ashwin, J. H. Tucker, and R. C. Newman, Phys. Rev. B 57, R15048 (1998).
14. E. V. Lavrov and J. Weber, Phys. Rev. Lett. 89, 215501 (2002).
15. J. Vetterhöffer, J. Wagner, and J. Weber, Phys. Rev. Lett. 77, 5409 (1996).
16. M. Hiller, E. V. Lavrov, J. Weber, B. Hourahine, R. Jones, and P. R. Briddon, Phys. Rev. B 72, 153201 (2005).
17. A. van Wieringen and N. Warmoltz, Physica (Amsterdam) 22, 849 (1956).
18. C. H. Seager and R. A. Andersen, Appl. Phys. Lett. 53, 1181 (1988).
19. F. Jiang, M. Stavola, A. Rohatgi, D. Kim, J. Holt, H. Atwater, and J. Kalejs, Appl. Phys. Lett. 83, 931 (2003).
20. V. P. Markevich and M. Suezawa, J. Appl. Phys. 83, 2988 (1998).
21. W. M. Arnoldbik, C. H. M. Maŕe, A. J. H. Maas, M. J. van den Boogaard, F. H. P. M. Habraken, and A. E. T. Kuiper, Phys. Rev. B 48, 5444 (1993).
22. H. Schmidt, W. Gruber, G. Borchardt, M. Bruns, M. Rudolphi, and H. Baumann, J. Phys.: Condens. Matter 16, 4233 (2004).