Fabrication and characterization of PECVD-silicon oxynitride based waveguides

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5355, Issue , 2004, Pages 198-205

  Alayo, M I ^a   Criado, D ^a   Carreno M N P ^a   Pereyra, I ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Optical integrated circuits; Plasma enhanced chemical vapor deposition; Silicon oxynitride; Waveguides

Indexed keywords

CHARACTERIZATION; DIFFRACTION GRATINGS; FABRICATION; INTEGRATED CIRCUITS; OPTICAL FIBER FABRICATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE;

OPTICAL INTEGRATED CIRCUITS; SILICON OXYNITRIDE;

OPTICAL WAVEGUIDES;

EID: 3543114950     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.528699     Document Type: Conference Paper

References (28)

1. C. Domínguez, J.A. Rodriguez, F. J. Munoz, N. Zine, "Plasma enhanced CVD silicon oxide films for integrated optic applications", Vacuum 52, 395-400, 1999.
2. M. Modreanu, M. Gartner, "Investigation on optical properties of CVD films used in MOEMS applications", Journal of Molecular Structure 565-566, 519-523, 2001.
3. D. Criado, I. Pereyra, M.I. Alayo, "Study of nitrogen-rich silicon oxynitride films obtained by PECVD", Materials Characterization 50, 167-171, 2003.
4. 2 optical waveguide as a control gate", Jpn. J. Appl. Phys. 41, 2563-2565, 2002.
5. A. Zhang, K.T. Chan, "Characterization of the optical loss of an integrated silicon oxynitride optical switch structure", Applied Physics Letters 83, 2524-2526, 2003.
6. G.-L. Bona, R. Germann, B.J. Offrein, "SiON high-refractive-index and planar lightwave circuits", IBM Journal of Research & Development 47, 239-249, 2003.
7. E.S. Bulat, M. Tabasky, B. Tweed, C. Herrick, S. Hankin, N.J. Lewis, D. Oblas, T. Fitzgerald, "Fabrication of wave-guides using low-temperature plasma processing techniques", Journal of Vacuum Science & Technology A 11, 1268-1274, 1993.
8. R. Germann, H.W.M. Salemink, R. Beyeler, G.L. Bona, F. Horst, I. Massarek and B.J. Offrein, "Silicon oxynitride layers for optical waveguide applications", Journal of the Electrochemical Society 147, 2237-2241, 2000.
9. B.S. Sahu, O.P. Agnihotri, S.C. Jain, R. Mertens and I. Kato, "Influence of hydrogen on losses in silicon oxynitride planar optical waveguides", Semiconductor Science and Technology 15, L11-L14, 2000.
10. y and SiO2 films obtained by PECVD technique at low temperatures", Thin Solid Films 332, 40-45, 1998.
11. C. Gorecki, "Optimization of plasma-deposited silicon oxynitride films for optical channel waveguides", Optics and Lasers in Engineering 33, 15-20, 2000.
12. Y.P. Li, C.H. Henry, "Silica-based optical integrated circuits", IEE Proceedings Optoelectronics 143, 263-280, 1996.
13. N. Takato, K. Jinguji, M. Yasu, H. Toba, M. Kawachi, "Silica-based single-mode wave-guides on silicon and their application to guided-wave optical interferometers", Journal of Lightwave Technology 6, 1003-1010, 1988.
14. y films", Thin Solid Films 402, 154-161, 2002.
15. M.I. Alayo, D. Criado, L.C.D Gonçalves, I. Pereyra, "Deposition and characterization of silicon oxynitride for integrated optical applications", Journal of Non Crystalline Solids in press., 2004.
16. U. Fischer, T. Zinke, J.-R. Kropp, F. Ardnt, and K. Petermann, "0.1 dB/cm waveguide losses in single-mode SOI rib waveguides", EEEE Fhotonics Technology Letters 8, 647-648, 1996.
17. R. Muller, P. Obreja, V. Banu, I. Pavelescu, D. Dascalu, "Silicon-compatible waveguides used for an integrated opto-mechanical pressure sensor", Optical Materials 17, 255-258, 2001.
18. J.M. Ruano, A.Glidle, A. Cleary, A. Walmsley, J.S. Aitchison, J.M. Cooper, "Design and fabrication of a silica on silicon integrated optical biochip as a fluorescence microarray platform", Biosensor and Bioelectronics 18, 175-184, 2003.
19. M. Tabib-Azar, G. Beheim, "Modern trends in microstructures and integrated optics for communication, sensing, and actuation", Optical Engineering 36, 1307-1318, 1997.
20. 3 gaseous mixture", Sensors and Actuators A-Physical 74, 52-55, 1999.
21. Y.T. Kim, S.M. Cho, Y.G. Seo, H.D. Yoon, Y.M. Im, S.J. Suh, D.H. Yoon, "Refractive index control of core layer using PECVD and FHD for silica optical waveguide", Surface and Coatings Technology 171, 34-38, 2003.
22. I. Pereyra, M.I. Alayo, "High quality low temperature DPECVD silicon dioxide", Journal of Non-Crystalline Solids 212, 225-231, 1997.
23. P.K. Tien, R. Ulrich, and R.J. Martin, "Modes of propagating light waves in thin deposited semiconductor films", Applied Physics Letters 14, 291, 1969.
24. A. Sakai, G. Hara, T. Baba,"Propagation characteristics of ultrahigh-Δ optical waveguide on silicon-on-insulator substrate", Japanese Journal of Applied Physics Part 2 40, L383-L385, 2001.
25. T. Sugano, Applications of Plasma Processes to VLSI Technology, Wiley-Interscience publications, 1985.
26. N. G. Einspruch, D. M. Brow, VLSI Electronics - Microstructure Science, Plasma Processing for VLSI, volume 8, Academic Press, Inc., 1984.
27. nd edition, CRC Press, 2002.
28. nd edition, Springer-Verlag Berlin Heidelberg New York Tokio, Germany, 1985.