Refractive index control of core layer using PECVD and FHD for silica optical waveguide

Surface and Coatings Technology

Volumn 171, Issue 1-3, 2003, Pages 34-38

  Kim, Y T ^a   Cho, S M ^a   Seo, Y G ^b   Yoon, H D ^b   Im, Y M ^b   Suh, S J ^a   Yoon, D H ^a  

^a Sungkyunkwan University   (South Korea)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

Author keywords

Optical properties; Plasma enhanced chemical vapor deposition; Silicon oxynitride

Indexed keywords

ETCHING; INDUCTIVELY COUPLED PLASMA; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA;

FLAME HYDROLYSIS DEPOSITION (FHD);

OPTICAL WAVEGUIDES;

CHEMICAL VAPOR DEPOSITION; ETCHING; OPTICAL TECHNIQUE;

EID: 0037706824     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00232-9     Document Type: Article

References (13)

1. Zhang J. Ren Z. Liang R. Sui Y. Liu W. Surf. Coat. Technol. 131 2000 116
2. Righini G.C. Laybourn P.J.R. Interated optics Jha S.S. Perspectives in Optoelectronics 1995 679 World Sci. Singapore
3. Choi J.K. Kim D.H. Lee J. Yoo J.B. Surf. Coat. Technol. 131 2000 136
4. Takato N. Sugita A. Mater. Res. Soc. Symp. Proc. 1990 172
5. Suzuki S. Kawachi M. Electron. Commun. Jpn. 77 11 1994 25
6. Allen J.J. Shipley S.P. Ong T.M. Nourshargh N. GEC J. Res. 10 2 1994 96
7. Wolf S. Tauber R.N. Silicon Processing for the VLSI Era 1986 Lattice Sunset Beach, CA
8. Kominato T. Ohmori Y. Okazaki H. Yasu M. Electron. Lett. 26 1990 327
9. M. Kawachi, J. Noda, Proceedings of the Optical Fibre Sensors 7 (OFS'7), 1990, p. 101.
10. Izawa T. Sudo S. Optical Fibers: Material and Fabrication (ADOP) 1987 123 KTK Scientific Publishers Tokyo
11. Suzuki C.K. Torikai D. Radiat. Eff. Def. Solids 147 1998 411
12. Mahahara M. Chida K. Hanawa F. Sudo S. Horiguchi M. Electron. Lett. 16 1979 102
13. Beales K.J. Day C.R. Phys. Chem. Glasses 21 1 1980 5