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Materials Characterization

Volumn 50, Issue 2-3, 2003, Pages 167-171

Study of nitrogen-rich silicon oxynitride films obtained by PECVD

(3) Criado, D a Pereyra, I a Alayo, M I a

a UNIVERSITY OF SÃO PAULO (Brazil)

Author keywords

Plasma enhanced chemical vapor deposition; Silicon nitride; Silicon oxynitride

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS;

GASEOUS MIXTURES;

THIN FILMS;

EID: 0141998773 PISSN: 10445803 EISSN: None Source Type: Journal
DOI: 10.1016/S1044-5803(03)00075-5 Document Type: Conference Paper

Times cited : (53)

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