Plasma enhanced CVD silicon oxide films for integrated optic applications

Vacuum

Volumn 52, Issue 4, 1999, Pages 395-400

  Domínguez, Carlos ^a   Rodríguez, José A ^b   Muñoz, Francisco J ^a   Zine, Nadia ^a  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b UNIVERSITY OF HAVANA   (Cuba)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); FILM GROWTH; FLOW OF FLUIDS; HYDROGEN BONDS; INTEGRATED OPTICS; OXIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX;

GROWTH RATE; SILICON OXIDE FILM; THICKNESS;

DIELECTRIC FILMS;

EID: 0033114985     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00299-1     Document Type: Article

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