Optimization of plasma-deposited silicon oxinitride films for optical channel waveguides

Optics and Lasers in Engineering

Volumn 33, Issue 1, 2000, Pages 15-20

  Gorecki, Christophe ^a  

^a FEMTO ST INSTITUTE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OPTICAL FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; STRESS ANALYSIS; THIN FILMS;

OPTICAL CHANNEL WAVEGUIDES; SILICON OXYNITRIDE;

OPTICAL WAVEGUIDES;

EID: 0033722232     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0143-8166(00)00024-5     Document Type: Article

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