Integration of a new alignment sensor for advanced technology nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Hinnen, Paul ^a   Depre, Jerome ^b   Tanaka, Shinichi ^b   Lim, Ser Yong ^a   Brioso, Omar ^a   Shahrjerdy, Mir ^a   Ishigo, Kazutaka ^c   Kono, Takuya ^c   Higashiki, Tatsuhiko ^c  

^a ASML   (Netherlands)

^b Tokyo 140 0001   (Japan)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

Advanced; Alignment; Alignment sensor; Applications; Mark design; Overlay; Strategy optimization

Indexed keywords

ALIGNMENT; LITHOGRAPHY; OPTIMAL CONTROL SYSTEMS; ROBUST CONTROL; SILICON WAFERS;

ADVANCED; ALIGNMENT SENSOR; MARK DESIGN; STRATEGY OPTIMIZATION;

SENSORS;

EID: 35148874221     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712084     Document Type: Conference Paper

References (16)

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