Extended ATHENA™ alignment performance and application for the 100 nm technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 682-694

  Navarro, R ^a   Keij, S ^a   Den Boef, A ^a   Schets, S ^a   Van Bilsen, F ^a   Simons, G ^a   Schuurhuis, R ^a   Burghoorn, J ^a  

^a ASML   (Netherlands)

Author keywords

Alignment Systems; Cu Damascene; Overlay; RF Phase Modulation; STI; W CMP; Wafer Alignment Strategies

Indexed keywords

CHEMICAL MECHANICAL POLISHING; PHASE MODULATION; PHOTOLITHOGRAPHY; PRODUCT DEVELOPMENT;

WAFER ALIGNMENT;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034768174     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436795     Document Type: Conference Paper

References (7)

1. Overlay performance in advanced processes
2. Advances in process overlay
3. Deep UV wafer stepper with through the lens alignment
4. Improved wafer stepper alignment performance using an enhanced phase grating alignment system
5. Overlay performance on tungsten CMP layers using the ATHENA™ alignment System