Overlay performance in advanced processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 520-531

  Bornebroek, F ^a   Burghoorn, J ^a   Greeneich, J S ^a   Megens, H J ^a   Satriasaputra, D ^a   Simons, G ^a   Stalnaker, S ^a   Koek, B ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; INTEGRATED CIRCUIT MANUFACTURE; OPTICAL SENSORS;

CHEMICAL MECHANICAL POLISHING (CMP); WAFER ALIGNMENT SENSORS;

PHOTOLITHOGRAPHY;

EID: 0033684529     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389040     Document Type: Conference Paper

References (7)