Segmented alignment mark optimization and signal strength enhancement for deep trench process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 2, 2004, Pages 1265-1277

  Cui, Yuanting ^a   Goodwin, Frank ^a   Van Haren, Richard ^b  

^a INFINEON TECHNOLOGIES   (United States)

^b ASML   (Netherlands)

Author keywords

Alignment; Deep Trench; Mark; Overlay; Process; Signal Strength

Indexed keywords

DEEP TRENCH; MARK; OVERLAY; PROCESS; SIGNAL STRENGTH;

CORRELATION METHODS; ETCHING; OPTIMIZATION; POLYSILICON; SIGNAL THEORY; SIGNAL TO NOISE RATIO;

PROCESS CONTROL;

EID: 4344678638     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.532896     Document Type: Conference Paper

References (5)

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