Advances in phase-grating-based wafer alignment systems

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 948-960

  Keij, Stefan ^a   Setija, Irwan ^a   Van Der Zouw, Gerbrand ^a   Ebert, Earl ^b  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

Author keywords

IC processing; Mark design; Overlay; Phase grating; Wafer alignment sensor

Indexed keywords

ALIGNMENT; INTEGRATED CIRCUITS; INTERFEROMETERS; PARAMETER ESTIMATION;

PHASE GRATINGS; PRODUCT OVERLAY; SELF-REFERENCING INTERFEROMETERS; WAFER ALIGNMENT SYSTEMS;

DIFFRACTION GRATINGS;

EID: 24644464706     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599090     Document Type: Conference Paper

References (10)

1. Ramon Navarro et al., Extended ATHENA™ Alignment Performance and Application for the 100nm Technology Node; Proceedings SPIE 2001
2. Jeroen Huijbregtse et al., Overlay Performance with Advanced ATHENA™ Alignment Strategies; Proceedings SPIE 2003
3. Paul Hinnen et al., Integration of a New Alignment Mark Design in Dual Inlaid Copper Processes; Proceedings ARCH 2003
4. Hans Gijsbertsen et al., Wafer Alignment with Back Scatter Electron Detection; Proceedings SPIE 2003
5. Rene Monshouwer et al., A High Resolution Broadband Phase-Grating Alignment System for Microlithography, PHILIPS Research, internal Technical Note 2001/252
6. Rene Monshouwer et al., Measurements of the Processing Dependence of a High NA /Broadband Phase-Grating Alignment System for Wafer Scanners, PHILIPS Research, internal Technical Notes 2002/177 and 2003/914
7. Paul Hinnen et al., Flexible Alignment Mark Design Applications using a Next Generation Phase Grating Alignment System, proceedings SPIE 2005
8. Yuanting Cui et al., Segmented Alignment Mark Optimisation and Signal Strength Enhancement for Deep Trench Process; proceedings SPIE 2004
9. Scott Warrick et al., Integration of New Alignment Mark Designs in Dual Inlaid Copper Interconnect Processes, proceedings SPIE 2002
10. Paul Hinnen et al., Advances in Process Overlay; proceedings SPIE 2001