Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 854-864

  Warrick, Scott ^a   Hinnen, Paul ^d   Morton, Rob ^b   Cooper, Kevin ^a   Sassoulas, Pierre Olivier ^c   Depre, Jerome ^d   Navarro, Ramon ^d   Van Haren, Richard ^d   Browning, Clyde ^a   Reber, Doug ^a   Megens, Henry ^d  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b NXP SEMICONDUCTORS   (Netherlands)

^c STMICROELECTRONICS   (France)

^d ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

SCATTER-BARS; SCRIBE LANE MARK (SLM); SIGNAL STRENGTH; SIGNAL STRENGTH STABILITY;

COPPER; OPTICAL DESIGN; OPTIMIZATION; PERFORMANCE; SIGNAL PROCESSING;

PHOTOLITHOGRAPHY;

EID: 25144503816     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599807     Document Type: Conference Paper

References (15)

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