Alignment mark signal simulation system for the optimum mark feature selection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 105-113

  Sato, Takashi ^a   Endo, Ayako ^a   Higashiki, Tatsuhiko ^a   Ishigo, Kazutaka ^a   Kono, Takuya ^a   Sakamoto, Takashi ^a   Shioyama, Yoshiyuki ^a   Tanaka, Satoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Alignment; Mark; Overlay; Process; Signal; Simulation; System

Indexed keywords

OVERLAY; PROCESS OF RECORD (POR); PROCESS SIMULATORS; SIGNAL SIMULATION;

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; DATABASE SYSTEMS; IMAGE PROCESSING; IMAGE SEGMENTATION; PROBLEM SOLVING; SENSORS; SIGNAL THEORY;

FEATURE EXTRACTION;

EID: 4344570582     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.532808     Document Type: Conference Paper

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